Alignment technique
US4546260A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 30, 1983 |
| Grant date | Oct 8, 1985 |
| Priority date | — |
| Expiry date | Jun 30, 2003 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An alignment system for registration of a scanning beam in a mask inspection tool. Minimum scan widths (W) in the registration process are attained thereby increasing registration sensitivity. This technique allows initial placement of the E-Beam to be outside the capture range so that the scan on one side is completely off the metal (on glass) and the scan on the other side is completely on the metal. Correction signals are obtained by comparing the backscattered electron signals from the two scans with the magnitude of the signal being indicative of the amount of correction required and the sign being indicative of the direction of correction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.