Process for the photochemical vapor deposition of hetero-linked polymers
US4547395A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 26, 1984 |
| Grant date | Oct 15, 1985 |
| Priority date | — |
| Expiry date | Nov 26, 2004 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D3/06
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A low temperature photochemical vapor deposition process for the deposition of a layer of a chosen polymer on the surface of a substrate. The polymer comprises repeating hydrocarbon units linked through oxygen, nitrogen, or sulfur atoms and is formed by reacting a vapor phase monomer precursor containing the hydrocarbon units and a vapor phase precursor containing the oxygen, nitrogen, or sulfur under radiation inducement. The low temperature of the process avoids thermal damage to the substrate. Specifically disclosed polymers are polyphenylether and polyxyleneamine, which are useful, respectively, as insulator or passivation layers in semiconductor devices and circuits, and as adhesives.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.