Pattern inspection system
US4547895A · kind A · utility
30Cited by
2References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 30, 1982 |
| Grant date | Oct 15, 1985 |
| Priority date | — |
| Expiry date | Sep 30, 2002 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06V10/20
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A pattern inspection system for inspecting a pattern formed on a base, such as a photomask, by means of laser beam scanning which includes a device for detecting the body and edges of the pattern, a memory device having a plurality of memory units for separately storing the detected body and plurality of edges of the pattern, a device for measuring the width of the body of the pattern between two parallel edges of the pattern, a device for detecting and correcting missing pattern edges, a device for inverting the pattern, a device for reducing the pattern, and a device for eliminating pinholes and stains within the pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.