Process for the disproportionation of silanes
US4548917A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 24, 1984 |
| Grant date | Oct 22, 1985 |
| Priority date | — |
| Expiry date | Feb 24, 2004 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07F7/125
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
Silane, SiH.sub.4, and diochlorosilane, particularly suitable for the preparation of silicon are readily obtained by disproportionating trichlorosilane to dichlorosilane and, ultimately silane by reacting: PA0 (a) a silane containing at least one Si-H bond, of the general formula R.sub.n H.sub.m SiX.sub.4-(n+m) wherein R represents an alkyl or aryl group, x represents a halogen or an alkoxy group, n is an integer equal to 0, 1, 2 or 3 and m is an integer equal to 1, 2 or 3, and PA0 (b) a catalyst system comprising an ionic inorganic salt of the formula M.sup.+ A.sup.- and a compound capable of at least partially dissociating the salt by complexing its cation M.sup.+.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.