Positive photoresist compositions with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate
US4550069A · kind A · utility
50Cited by
16References
11Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 11, 1984 |
| Grant date | Oct 29, 1985 |
| Priority date | — |
| Expiry date | Jun 11, 2004 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0226
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention provides a positive working photosensitive composition which comprises at least one novolak resin, at least one o-quinone diazide and a propylene glycol alkyl ether acetate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.