Light-radiant furnace for heating semiconductor wafers
US4550245A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 29, 1983 |
| Grant date | Oct 29, 1985 |
| Priority date | — |
| Expiry date | Mar 29, 2003 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05B3/0047
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A light-radiant heating furnace including a box-shaped container, having a transparent wall portion, adapted to receive an object to be treated, for example, a large-sized semiconductor wafer, a reflector arranged in the proximity of outer surfaces of the transparent wall portion of the container, a space formed between the reflector and the outer surface of the transparent wall portion of the container, tubular lamps provided in the space and an air duct equipped with a cooling fan and arranged in communication with the spacing only. The lamps and their adjacent reflector and container wall can be efficiently cooled by causing cooling air to pass through the air duct and space, thereby avoiding overheating of the lamps and thus prolonging the service lives of the lamps. The reflector may be provided with water conduits through which cooling water flows.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.