Stencil
US4550660A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 11, 1983 |
| Grant date | Nov 5, 1985 |
| Priority date | — |
| Expiry date | Oct 11, 2003 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31721
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
This invention provides stencil from which a patternwise perforated stencil can be easily made by handwriting, a stencil material set with which a patternwise perforated stencil can be made, and a stencil duplicator set which, in combination with the stencil, performs simple, clear printing. The stencil is made up of a porous support and a masking film formed thereon, said masking film being made of a water-insoluble polymer having tertiary amino groups. The stencil material set contains the stencil and a patternwise perforated stencil-making solution which forms a water-soluble product upon reaction with said polymer. Stencil printing is performed using the patternwise perforated stencil, a stencil duplicator and printing ink.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.