Photoresist composition of cocondensed naphthol and phenol with formaldehyde in admixture with positive o-quinone diazide or negative azide
US4551409A · kind A · utility
45Cited by
7References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 7, 1983 |
| Grant date | Nov 5, 1985 |
| Priority date | — |
| Expiry date | Nov 7, 2003 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08L61/06
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A photoresist composition comprising a sensitizer in a binder that is a naphthol polymer alone or mixed with another compatible resin such as a novolak resin or a polyvinyl phenol. The use of the naphthol resin as a portion of the binder increases the heat distortion temperature of the photoresist composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.