Silver halide photographic light-sensitive material for photomechanical process and method of reduction treatment therefore
US4551412A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 17, 1983 |
| Grant date | Nov 5, 1985 |
| Priority date | — |
| Expiry date | Aug 17, 2003 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/15
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A silver halide photographic light-sensitive material for photo-mechanical process comprising a support having thereon at least one light-sensitive silver halide emulsion layer and at least one light-insensitive upper layer which is positioned above the light-sensitive silver halide emulsion layer, wherein at least one of the light-insensitive upper layers has a melting time longer than a melting time of the light-sensitive silver halide emulsion layer and the light-insensitive upper layer contains a polymer latex. The silver halide photographic light-sensitive material has excellent aptitude for reduction treatment without increasing the amount of silver per unit area. The occurrence of reticulation is prevented with the silver halide photographic light-sensitive material. A method of reduction treatment for a silver halide photographic light-sensitive material for photo-mechanical process comprising the steps of: exposing the silver halide photographic light-sensitive material as described above, development processing the exposed silver halide photographic light-sensitive material to form a silver image, and carrying out reduction treatment of the silver image is also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.