Patent · US Expired

Process for producing amorphous and crystalline silicon nitride

US4552740A · kind A · utility

10Cited by
1References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 22, 1985
Grant dateNov 12, 1985
Priority date
Expiry dateFeb 22, 2005

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01P2004/61
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

A process for producing amorphous or crystalline silicon nitride is disclosed which comprises reacting silicon disulfide ammonia gas at elevated temperature. In a preferred embodiment silicon disulfide in the form of "whiskers" or needles is heated at temperature ranging from about 900.degree. C. to about 1200.degree. C. to produce silicon nitride which retains the whisker or needle morphological characteristics of the silicon disulfide. Silicon carbide, e.g. in the form of whiskers, also can be prepared by reacting substituted ammonia, e.g. methylamine, or a hydrocarbon containing active hydrogen-containing groups, such as ethylene, with silicon disulfide, at elevated temperature, e.g. 900.degree. C.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.