Silver halide photographic light-sensitive element having a light insensitive upper layer
US4552835A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 14, 1984 |
| Grant date | Nov 12, 1985 |
| Priority date | — |
| Expiry date | Jun 14, 2004 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/162
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A silver halide photographic light-sensitive material for photomechanical process and a method for the reduction treatment of said light-sensitive material are described. The light-sensitive material comprises a support, at least one light-sensitive silver halide emulsion layer, and at least one light-insensitive upper layer, characterized in that at least one light-insensitive upper layer contains a polymer comprising: (a) a monomer unit containing at least one group having an electric charge; and (b) a monomer unit having a functional group capable of crosslinking through a gelatin hardening agent with a like functional group of another polymer chain of the same type or with gelatin. The light-sensitive material is very advantageous; for example, it has greatly improved reduction treatment suitability, and the reduction treatment suitability is not deteriorated even if the amount of silver coated per unit area is reduced.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.