Semiconductor device and method of manufacturing same, as well as a pick-up device and a display device having such a semiconductor device
US4554564A · kind A · utility
8Cited by
5References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 5, 1982 |
| Grant date | Nov 19, 1985 |
| Priority date | — |
| Expiry date | Feb 5, 2002 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31784
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The invention relates to a method for displaying a pattern on a resist using electron lithography. In particular, a cathode device having a matrix of semiconductor cathodes generates an electron beam which exposes a resist layer. The electron beam is generated by applying control signals to selected ones of the matrix of cathodes to cause electron emission therefrom.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.