Patent · US Expired

Method of fabricating long period optical grating

US4555162A · kind A · utility

3Cited by
3References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 5, 1984
Grant dateNov 26, 1985
Priority date—
Expiry dateMar 5, 2004

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T29/49787
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A long period buried optical grating is fabricated by polishing a number of single crystal silicon wafers to identical thicknesses and flat figure, applying a light reflective metallic coating to the wafers, thereafter bonding the wafers together in a stack, and thereafter lapping the resulting stack of bonded layers at an acute angle with respect to the major planar surfaces of the wafers to form the buried grating, such grating having optically flat reflective sawtoothed elements. The grating period may be readily controlled by changing the acute angle and/or the thickness of the silicon wafers.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.