Image-recording materials and image-recording carried out using these

US4555471A · kind A · utility

Assignee

• BASF SE

Inventors

• Helmut Barzynski · Bad Dürkheim, DE
• Klaus Holoch · Frankenthal (Pfalz), DE

Key dates

• Filing date: Dec 4, 1984
• Grant date: Nov 26, 1985
• Expiry date: Dec 4, 2004

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S522/907
• WIPO field: Textile and paper machines
• WIPO sector: Mechanical engineering

Abstract

A resist film comprises a dimensionally stable base (B), which is transparent to actinic light in the wavelength range from 300 to 420 nm, and a mask-forming layer (ML) which is sensitive to heat radiation and contains a thermochromic system which, when irradiated with an IR laser having a wavelength greater than 1.00 .mu.m, undergoes an irreversible change in its absorption spectrum in the wavelength range from 300 to 420 nm so that the optical density of the mask-forming layer (ML) in this wavelength range changes by not less than 1.3 units. The base of the resist film can also be applied onto the photosensitive relief-forming layer (RL) of a recording material to give a multilayer image-recording material. Imagewise irradiation with heat, for example using an IR laser, produces, in the mask-forming layer (ML) of the resist film, a UV photomask which is very useful for exposing photosensitive recording materials.