Heat reflection film
US4556599A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 23, 1984 |
| Grant date | Dec 3, 1985 |
| Priority date | — |
| Expiry date | Oct 23, 2004 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24975
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A heat-reflection film comprising: PA0 a first layer formed on a base plate, the optical thickness of the first layer being approximately .lambda./8 or 3.lambda./8, in which .lambda. is the designed wavelength; PA0 a plurality of intermediate layers from a second layer to a (2n+2)th layer, in which n is a positive integral number, the optical thickness of each intermediate layer being .lambda./4; and PA0 an uppermost (2n+3)th layer, the optical thickness of which is approximately .lambda./8, PA0 wherein n.sub.g <n.sub.1 <n.sub.2, in which n.sub.g is the refractive index of the base plate, n.sub.1 is the refractive index of the first layer, and n.sub.2 is the refractive index of the second layer, the layers formed above the first layer being arranged in such a manner that high refractive index layers and low refractive index layers are alternately stacked, the second layer being arranged as a high refractive index layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.