Negative-type acetalized polyvinyl alcohol resist sensitive to ionizing radiation
US4556619A · kind A · utility
4Cited by
3References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 5, 1982 |
| Grant date | Dec 3, 1985 |
| Priority date | — |
| Expiry date | Oct 5, 2002 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/11
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An acetalized polyvinyl alcohol having a molecular weight of 10,000 to 1,000,000 represented by the formula: ##STR1## wherein: R.sup.1 represents a halogen-containing residue of an aldehyde or a ketone; R.sup.2 represents a hydrogen atom, which may partially be substituted with an acetyl group; R.sup.3 represents naught or a monomeric unit copolymerizable with vinyl acetate; and l, m, n are integers indicating polymerization degrees, has excellent characteristics such as high sensitivity, high resolving power and excellent dry etching resistance and is suitable as a negative-type resist in ionizing radiation lithography.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.