Method of fabricating solar cells
US4557037A · kind A · utility
32Cited by
4References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 13, 1984 |
| Grant date | Dec 10, 1985 |
| Priority date | — |
| Expiry date | Dec 13, 2004 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
Abstract
A solar cell fabrication procedure is described in which a hydrogen ion passivation step is used to form, inter alia, an altered silicon substrate surface layer to which immersion plated nickel will not readily adhere. The altered surface layer is formed by shadow casting an ion beam in a pattern corresponding to the desired front surface interelectrode configuration.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.