Light induced production of ultrafine powders comprising metal silicide powder and silicon
US4558017A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 14, 1984 |
| Grant date | Dec 10, 1985 |
| Priority date | — |
| Expiry date | May 14, 2004 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01B33/06
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A method of producing ultrafine powders comprising metal silicide powder and the products produced by the method are disclosed. The ultrafine powders comprising metal silicide powders are ideally suited to form stable colloidal suspensions which are used in the production of conductive metal silicide containing films. The process employs gaseous reactants comprising a metal halide and a silicon-containing compound. The reactants are exposed to high intensity light to produce ultrafine powders. In addition to the production of metal silicide powders, the ultrafine powders may also include silicon powder and metal subhalide powder. The ultrafine powders are particularly suited for use in VLSI and VVLSI production.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.