Patent · US Expired

Process and apparatus for measuring wave surface distortions introduced by an optical system

US4558948A · kind A · utility

3Cited by
5References
33Claims
0Family size

Assignee

Inventor

Key dates

Filing dateNov 5, 1982
Grant dateDec 17, 1985
Priority date
Expiry dateNov 5, 2002

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01J9/04
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

The invention relates to an apparatus for measuring the wave surface distortions introduced by a lens, comprising a source which emits coherent light of frequency .nu.o; means for creating a reference beam and a measuring beam; a Bragg cell receiving and transmitting said beams, excited by a radio-frequency wave of frequency f emitted by a generator, the reference beam transmitted having the frequency .nu.o and the measuring beam diffracted by the cell having a frequency .nu.o+f; means for transmitting the beams from the cell to the lens to be tested; detection means transforming the light signal from the lens into an electrical signal of frequency f and whereof the phase is characteristic of the wave surface distortions introduced by the lens; and means for measuring the phase displacement between the phase of the electrical signal from the detection means and the phase of an electrical signal corresponding to the radio-frequency waves.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.