Method of precisely modifying predetermined surface layers of a workpiece by cluster ion impact therewith
US4559096A · kind A · utility
40Cited by
0References
33Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 25, 1984 |
| Grant date | Dec 17, 1985 |
| Priority date | — |
| Expiry date | Jun 25, 2004 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T156/1057
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method of precisely modifying a selected area of a workpiece by producing a beam of charged cluster ions that is narrowly mass selected to a predetermined mean size of cluster ions within a range of 25 to 10.sup.6 atoms per cluster ion, and accelerated in a beam to a critical velocity. The accelerated beam is used to impact a selected area of an outer surface of the workpiece at a preselected rate of impacts of cluster ions/cm.sup.2 /sec. in order to effect a precise modification in that selected area of the workpiece.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.