Electrophotographic light-sensitive material
US4559289A · kind A · utility
26Cited by
6References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 3, 1984 |
| Grant date | Dec 17, 1985 |
| Priority date | — |
| Expiry date | Jul 3, 2004 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03G5/08278
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An electrophotographic light-sensitive material is described, comprising an electrically conductive support, an amorphous silicon photoconductive layer on the support, and a layer of amorphous material containing at least carbon and halogen atoms is provided on the photoconductive layer. This material is free from a serious reduction in resolving power as is encountered in conventional electrophotographic light-sensitive materials when they are exposed to corona discharge, particularly negative corona discharge under high temperature/humidity conditions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.