Photosensitive transfer material having a support of defined roughness

US4559292A · kind A · utility

Assignee

• Hoechst GmbH · DE

Inventors

• Ulrich Geissler · Hochheim, DE
• Walter Herwig · Bad Soden, DE
• Helga Sikora · Wiesbaden, DE

Key dates

• Filing date: Sep 29, 1983
• Grant date: Dec 17, 1985
• Expiry date: Sep 29, 2003

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/346
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The present invention relates to a photosensitive transfer material, which comprises a flexible temporary support film which is preferably transparent, a thermoplastic photosensitive layer, optionally a flexible cover film on the free side of the photosensitive layer and, optionally, an intermediate layer between the support film and the photosensitive layer. The photosensitive transfer material is suitable for manufacturing photoresist stencils and solder masks. The temporary support film has a rough surface which exerts an embossing effect on the surface of the photosensitive layer and the intermediate layer, respectively. The mat-finish of the intermediate layer prevents an irregular deformation of this layer in moist air, while the mat-finish of the photosensitive layer precludes unwanted reflections.