Silver halide sensor type polymerizable light-sensitive material
US4560637A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 21, 1982 |
| Grant date | Dec 24, 1985 |
| Priority date | — |
| Expiry date | Dec 21, 2002 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0285
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A process for forming a polymeric image in a silver halide sensor type polymerizable light-sensitive material having a silver halide photographic emulsion layer is disclosed. The process is comprised of reducing a development nucleus-containing silver halide using at least one phenol compound and at least one hydrazine compound in the presence of at least one non-gaseous ethylenically unsaturated compound capable of undergoing addition polymerization to selectively polymerize the non-gaseous ethylenically unsaturated compound in an area where the development nucleus-containing silver halide is present. The phenol compound is represented by the following general formula (I): ##STR1## wherein R.sub.1, R.sub.2, R.sub.2 ', R.sub.3 and R.sub.3 ' are defined within the disclosure. The hydrazine compound is represented by the following general formula (II): ##STR2## wherein R.sub.4, R.sub.5 and R.sub.6 are defined within the disclosure. The process for forming a polymeric image exhibits a high sensitivity and provides a negative polymeric image with respect to the silver image. A silver halide sensor type polymerizable light-sensitive material suitable for use in the process is also discl…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.