Focused ion beam microfabrication column
US4563587A · kind A · utility
26Cited by
8References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 7, 1983 |
| Grant date | Jan 7, 1986 |
| Priority date | — |
| Expiry date | Apr 7, 2003 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3007
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Focused ion beam microfabrication column (10) produces an ion beam from ion source (12), focuses the beam by objective lens (24) onto the plane of electrode (36). ExB filter (44) separates out the ion species at a low energy portion of the beam. The beam of selected species is first accelerated by energy central lens (38) which has a controllable potential for controlling the final beam energy to the target. The beam is accelerated by final accelerator lens (54) and is demagnified and focused on the target by that lens. Beam deflector (64) deflects the beam for programmed ion beam work on the target (60).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.