Method for producing a preform for light waveguides
US4564378A · kind A · utility
5Cited by
7References
8Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 9, 1984 |
| Grant date | Jan 14, 1986 |
| Priority date | — |
| Expiry date | Feb 9, 2004 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03B2207/34
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A method of producing a preform for light waveguides wherein glass-forming chlorides, e.g. SiCl.sub.4 and/or GeCl.sub.4, are reacted with water vapor to form a glass forming layer, e.g. SiO.sub.2 soot. This reaction advantageously takes place at relatively low temperatures, e.g. 20.degree. C.-800.degree. C. Surprisingly, almost no SiO.sub.2 deposition takes place on higher heated surfaces, e.g. in the reaction chamber. Elimination of annoying OH.sup.- ions is possible.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.