Spatial light modulator and method
US4566935A · kind A · utility
538Cited by
4References
6Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jul 31, 1984 |
| Grant date | Jan 28, 1986 |
| Priority date | — |
| Expiry date | Jul 31, 2004 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B26/0841
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Methods of fabrication of spatial light modulators with deflectable beams by plasma etching after dicing of a substrate into chips, each of the chips an SLM, is disclosed. Also, various architectures available with such plasma etching process are disclosed and include metal cloverleafs for substrate addressing, metal flaps formed in a reflecting layer over a photoresist spacer layer, and torsion hinged flaps in a reflecting layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.