Metallized and plated laminates
US4568413A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 22, 1984 |
| Grant date | Feb 4, 1986 |
| Priority date | — |
| Expiry date | Feb 22, 2004 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31681
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A carrier (10) is vapor-vacuum deposited with a vapor-vacuum deposited first metallic layer (14) of 10-90 nm in thickness. The carrier and vapor-vacuum deposited metal layers are selected of materials which, after vapor-vacuum depositing, adhere with less than about 3 pounds per linear inch of width, e.g., aluminum and copper or copper and copper. A second metallic layer (16) is electrolytically deposited to the vapor-vacuum deposited layer to increase the thickness of the first and second metal layers, taken together, to about 1-12 microns. The carrier and first and second metal layers are bonded under heat and pressure to a dielectric substrate (18). Thereafter, the carrier is peeled away leaving the vapor-vacuum deposited and electrolytically plated layers adhered to the dielectric substrate. Although the vapor-vacuum deposited layer and the electrolytically deposited layers may both be the same metal, such as copper which is preferred for circuit boards, the vapor-vacuum deposited layer may also be a relatively inactive metal, such as aluminum, chrome, zinc, or nickel, to protect the underlying electrolytically deposited metal layer from corrosion and staining.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.