Method for preparing phosphor adapted for producing photosensitive layers from an acid slurry
US4568479A · kind A · utility
3Cited by
8References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 17, 1984 |
| Grant date | Feb 4, 1986 |
| Priority date | — |
| Expiry date | Sep 17, 2004 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09K11/7708
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Prior to preparing an acid phosphor slurry for use in preparing dry photosensitive phosphor layers, particulate yttrium, lanthanum and/or gadolinium oxysulfide or vanadate phosphor is mixed with essentially water-insoluble particulate zinc phosphate in an aqueous medium. Then, the particle mixture is removed and dried. The invention includes both the novel method and the product of the novel method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.