Patent · US Expired

Asymmetrical layered structures of polyalkylene sulfone resins

US4568579A · kind A · utility

17Cited by
2References
11Claims
0Family size

Assignee

Inventor

Key dates

Filing dateNov 3, 1983
Grant dateFeb 4, 1986
Priority date
Expiry dateNov 3, 2003

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/31931
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

Asymmetrical layered structures such as asymmetrical films are disclosed. The main body section contains a multitude of pores (voids). A thin surface skin is free of pores. The entire structure is fabricated from a polyalkylene sulfone resin in which the alkylene moiety contains 6 to 18 carbon atoms. Processes for preparing the structures also are disclosed. The structures are semi-permeable to gases and are used as membranes to enrich the oxygen content of oxygen/nitrogen mixtures.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.