Electron-beam and X-ray sensitive polymers and resists
US4568734A · kind A · utility
4Cited by
10References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 12, 1984 |
| Grant date | Feb 4, 1986 |
| Priority date | — |
| Expiry date | Mar 12, 2004 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F220/40
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
There are disclosed polymers, E-beam sensitive elements and resists obtained therefrom, that are more sensitive than 5.times.10.sup.-7 coulombs per cm.sup.2 when exposed to a 15 keV electron beam. The polymers are copolymers of either allyl or propargyl methacrylate and of an acrylate or methacrylate bearing an oxygen-containing heterocyclic ring.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.