X-Ray Lithography apparatus
US4569068A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 6, 1984 |
| Grant date | Feb 4, 1986 |
| Priority date | — |
| Expiry date | Apr 6, 2004 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J35/305
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An X-ray lithography apparatus wherein a linear X-ray source is formed by line scanning a target with electron lines, a band-slit having slits which extend in the direction similar to the longitudinal direction of said linear X-ray source and a solar-slit having plural slits in the direction perpendicular to said band-slit are interposed between the X-ray source and a wafer in order to irradiate only the component which is substantially perpendicular to the surface of the wafer out of the X-ray generated from the linear source, and said wafer is made to move continuously or stepwise in respect of a rectangular region which is highly collimated in order to conduct X-ray transfer against a predetermined region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.