Method of producing amorphous carbon coatings on substrates by plasma deposition

US4569738A · kind A · utility

Assignee

• Leybold-Heraeus GmbH · DE

Inventors

• Jorg Kieser · Albstadt, DE
• Michael Neusch · Eßlingen, DE

Key dates

• Filing date: May 4, 1984
• Grant date: Feb 11, 1986
• Expiry date: May 4, 2004

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T428/31696
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A method for producing amorphous carbon coatings on substrates by degrading a gaseous hydrocarbon compound in an ionized gas atomsphere within a reaction chamber. An electromagnetic alternating field is used for the excitation of the plasma. To achieve the object of increasing the deposition rate and permitting substrates even of great surface area to be uniformly coated, the frequency of the electromagnetic alternating field is selected in the microwave region (915 to 2,540 MHz). Furthermore, the microwave energy is put into the gaseous atmosphere by means of at least one ladder-type waveguide situated outside of the reaction chamber. The invention also relates to a substrate provided with an amorphous carbon coating, in which an adhesion-mediating coating consisting of a polymer from the group of the siloxanes or silazanes is provided between the substrate and the amorphous carbon coating.