Method of forming a nitride layer
US4569862A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 14, 1985 |
| Grant date | Feb 11, 1986 |
| Priority date | — |
| Expiry date | May 14, 2005 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4488
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of forming a layer of a nitride or carbonitride of titanium, vanadium or the like on the surface of an article to be treated includes: disposing a treating material composed of refractory powder, powder of a metal or alloy of a nitride forming element and a halide power, and the article to be treated in a fluidized bed furnace; and introducing a nitrogen-containing gas into the furnace under a heated condition to fluidize the treating material, thereby effecting the surface treatment. This method provides a nitride or carbonitride layer having a smooth surface and a uniform thickness rapidly and safely without using hydrogen and a halogen vapor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.