Ion-beam monitor
US4570070A · kind A · utility
5Cited by
2References
3Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 12, 1984 |
| Grant date | Feb 11, 1986 |
| Priority date | — |
| Expiry date | Jun 12, 2004 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3005
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The ion-beam monitor determines the distribution of the ion beam intensity by scanning a flat pellet of Al.sub.2 O.sub.3 with the ion beam and detecting the ultra violet radiation emitted from the Al.sub.2 O.sub.3 pellet and recording the same at each step of the scanning operation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.