Centrifugal wafer processor
US4571850A · kind A · utility
25Cited by
2References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 17, 1984 |
| Grant date | Feb 25, 1986 |
| Priority date | — |
| Expiry date | May 17, 2004 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF26B25/008
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
In a rinser/dryer for carriers of semiconductor wafers, a rotatable frame containing the carrier is directly mounted to, and cantilevered from the drive motor. A container encloses the rotatable frame and carrier. A gas pressurized labyrinth seal separates the inside of the container from the drive motor to prevent contamination. A raised portion in the labyrinth seal, with gas inlets on each side of the raised portion, forms a pressure barrier inhibiting the passage of moisture and contaminates across the barrier.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.