Process for activating substrates for electroless metallization
US4575467A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 27, 1984 |
| Grant date | Mar 11, 1986 |
| Priority date | — |
| Expiry date | Jun 27, 2004 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C18/28
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Complex compounds of elements of sub-groups 1 and 8 of the periodic table in oxidation stages 1-4 with unsaturated ketones of the formula ##STR1## wherein R.sub.1 and R.sub.4 denote alkyl, cycloalkyl or aryl and PA1 R.sub.2 and R.sub.3 denote hydrogen or alkyl, are outstandingly suitable for activating substrate surfaces for electroless metallization since these complexes are distinguished by a high storage stability. The palladium complexes of but-3-en-2-one and hept-3-en-2-one are preferred.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.