Etching optical surfaces on GaAs
US4576691A · kind A · utility
6Cited by
3References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 31, 1984 |
| Grant date | Mar 18, 1986 |
| Priority date | — |
| Expiry date | Jul 31, 2004 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25F3/14
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Photoelectrochemical etching of gallium arsenide in highly alkaline aqueous solution yields optically smooth etched surfaces suitable for many optical devices. Higher optical quality is obtained for lower irradiation energy provided sufficient energy is available to produce holes in the valence band.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.