Patent · US Expired

Etching optical surfaces on GaAs

US4576691A · kind A · utility

6Cited by
3References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 31, 1984
Grant dateMar 18, 1986
Priority date
Expiry dateJul 31, 2004

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC25F3/14
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Photoelectrochemical etching of gallium arsenide in highly alkaline aqueous solution yields optically smooth etched surfaces suitable for many optical devices. Higher optical quality is obtained for lower irradiation energy provided sufficient energy is available to produce holes in the valence band.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.