Deposition of materials
US4576830A · kind A · utility
17Cited by
5References
20Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 5, 1984 |
| Grant date | Mar 18, 1986 |
| Priority date | — |
| Expiry date | Nov 5, 2004 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/907
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In a method and apparatus for continuous plasma CVD deposition in and through a vacuum system, box carriers are provided to carry both the substrates and the plasma exciting electrodes through the system. Contamination of the system and cross doping of the applied coatings are reduced.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.