Process of making photopolymer relief plates using an adhesive layer

US4576898A · kind A · utility

Assignee

• BASF SE

Inventors

• Gerhard Hoffmann · Otterstadt, DE
• Dieter Kleuser · Bischofswerda, DE
• Werner Lenz · Bad Dürkheim, DE

Key dates

• Filing date: Oct 9, 1984
• Grant date: Mar 18, 1986
• Expiry date: Oct 9, 2004

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/027
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Photopolymer relief plates are produced by applying a photopolymerizable relief-forming layer R, which contains a thermal polymerization inhibitor liberating nitrosyl free radicals on ultraviolet irradiation, to a dimensionally stable base which bears an adhesive layer A for the layer R, the layer A containing 0.01 to 10 percent by weight of a compound ##STR1## where R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are identical or different and each is alkyl or R.sup.5 --(O-alkylene).sub.x --, R.sup.5 being H or alkyl and x being 1, 2, 3, 4 or 5, and then exposing, and developing, the layer R in a conventional manner.