Process of making and using a positive working photosensitive film resist material

US4576902A · kind A · utility

Inventors

• Dietrich Saenger · Bischofswerda, DE
• Helmut Barzynski · Bad Dürkheim, DE

Key dates

• Filing date: Dec 4, 1984
• Grant date: Mar 18, 1986
• Expiry date: Dec 4, 2004

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/161
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A positive working photosensitive film resist material suitable for multiple image-wise exposure comprises, on a dimensionally stable base film, a photosensitive coating which contains (a) a polymer which possesses aromatic or hetero-aromatic o-nitrocarbinol ester groups (for example o-nitrobenzyl acrylate units) and which can be washed out, after exposure, with an alkaline solvent, and (b) a transparent plasticizer compatible with (a). The product may be used as photopolymer dry film resist material in the production of electrical conductor boards, chemically milled fine-line parts, and identification plates.