Device for process-type deposition of polycrystalline silicon on carbon film
US4577588A · kind A · utility
12Cited by
4References
7Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Aug 28, 1984 |
| Grant date | Mar 25, 1986 |
| Priority date | — |
| Expiry date | Aug 28, 2004 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A crucible containing molten silicon, has a strip of carbon film vertically transported through the melt, an optical system imaging a small area of the silicon surface onto a photodetector, said image area being that of the silicon liquid-solid interface, and a servo system connected to said photodetector and to an electrical drive for feeding silicon into said melt. The invention is applicable to the manufacture of solar cells.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.