Exposure apparatus
US4577959A · kind A · utility
12Cited by
2References
9Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 29, 1984 |
| Grant date | Mar 25, 1986 |
| Priority date | — |
| Expiry date | May 29, 2004 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/20
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus comprises a fly eye lens through which the light beam from a light source condensed by a first optical system is supplied to a second optical system which collimates the light to direct it to a work through a mask pattern so that the pattern is printed on the work, the fly eye lens being rotated to uniform the distribution of illuminance so that a clear printed pattern is formed on the work without interference fringes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.