Articles having improved reflectance suppression
US4578527A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 16, 1983 |
| Grant date | Mar 25, 1986 |
| Priority date | — |
| Expiry date | Nov 16, 2003 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S126/908
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Article having improved reflectance suppression comprising a substrate formed of a material having a reststrahlen band and having at least one surface and a coating carried by said one surface. The coating comprises at least one period with each period consisting of a spacer layer and an absorber layer. The spacer layer is formed of a material having a low index of refraction and has an optical thickness ranging from approximately one quarter of a wavelength and less. The spacer layer also has low absorption in the visible region of the spectrum. The absorber layer is formed of a material which has substantial absorption near the reststrahlen band. The absorber layer has a complex index of refraction as a function of wavelength which is relatively close to the index of refraction of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.