Laser heated CVD process
US4579750A · kind A · utility
42Cited by
4References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 30, 1984 |
| Grant date | Apr 1, 1986 |
| Priority date | — |
| Expiry date | Oct 30, 2004 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S148/093
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A laser powered chemical vapor deposition process and apparatus for producing heterogeneous nucleation and sustained growth of films on substrates. The process is conducted at low laser intensities and high reactant pressures so as to operate in the thermal domain. Semiconductor films and fabrication of fiber optic waveguides are illustrated in the process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.