Process for developing exposed diazo negative-working reproduction layers using aqueous developer having salt of aromatic carboxylic acid with adjacent group substituent

US4579811A · kind A · utility

Assignee

• Hoechst GmbH · DE

Inventors

• Loni Schell · Hofheim, DE
• Werner Frass · Wiesbaden, DE
• Inge Gros · Taunusstein, DE

Key dates

• Filing date: Dec 28, 1983
• Grant date: Apr 1, 1986
• Expiry date: Dec 28, 2003

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/32
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Disclosed is a developer composition for exposed, light-sensitive, negative-working reproduction layers, which may contain an organic binder, comprising water and a salt of a substituted aromatic carboxylic acid, in particular, from about 5 to 60% by weight of at least one salt of an aromatic carboxylic acid having substituents which are immediately adjacent to the carboxyl group and represent an amino group, a hydroxyl group, and/or chlorine or bromine. Also disclosed is a process for developing the reproduction layers utilizing the disclosed developers, wherein the reproduction layer contains, in particular, a polymeric organic binder with an acetal, anhydride, amide and/or a carboxyl group.