Method for generating inspection patterns
US4581537A · kind A · utility
3Cited by
5References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 23, 1984 |
| Grant date | Apr 8, 1986 |
| Priority date | — |
| Expiry date | Mar 23, 2004 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3005
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of forming inspection patterns for inspecting a workpiece, e.g., for electron beam inspection of optical photomasks. The inspection patterns are formed from the workpiece patterns themselves by applying a first positive windage to the workpiece patterns, inverting the first positive windaged workpiece patterns and applying a second positive windage to the inverted first positive windaged workpiece patterns. The inspection patterns so produced will contain the requisite guard band and the requisite overlap of abutting patterns.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.