Optical monitor for direct thickness control of transparent films
US4582431A · kind A · utility
25Cited by
3References
10Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 11, 1983 |
| Grant date | Apr 15, 1986 |
| Priority date | — |
| Expiry date | Oct 11, 2003 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/547
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Precise thickness control for high performance optical coatings is provided in an optical coating system utilizing an optical monitor. The optical monitor utilizes a light source and detecting arrangement that measures a sample optical element through the expedient of a light path altering structure that is not coincident with the axis of rotation of a deposition carrousel structure that supports optical elements being coated. The light source and detector arrangements can be mounted conveniently outside of the vacuum chamber of the optical coating system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.