Antistatic photographic multi-layer base having a hydrophilic and hydrophoetic layer
US4582782A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jun 8, 1984 |
| Grant date | Apr 15, 1986 |
| Priority date | — |
| Expiry date | Jun 8, 2004 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31971
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photographic base is protected against the adverse effects resulting from the accumulation of static electrical charges by providing it with a first antistatic hydrophilic layer and a second protective hydrophobic layer coated onto said first layer, said first layer having been formed by coating onto said base a liquid coating composition comprising a hydrophilic non-diffusing sulfonated polymer in the presence of an epoxy-silane compound. The antistatic base is particularly useful for photographic elements comprising at least one photosensitive image-forming layer, on one side thereof, and the first antistatic layer and the second protective layer on the opposite side thereof. The antistatic layer is durable, abrasion-resistant, non-tacky and can withstand the aqueous photographic processings without adverse effects.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.