Process for producing continuous insulated metallic substrate
US4585537A · kind A · utility
24Cited by
3References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 3, 1984 |
| Grant date | Apr 29, 1986 |
| Priority date | — |
| Expiry date | Dec 3, 2004 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process for producing a continuous web of an insulated metallic substrate, comprising the steps of depositing an insulation layer on a continuous web of a metallic substrate by plasma CVD method or sputtering method, and depositing a back electrode on the insulation layer by sputtering method or vapor deposition method. According to the present invention, the insulated metallic substrate for a solar cell or printed circuit board can be produced in a continuous manner and in high productivity and quality.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.