Pattern forming method
US4586980A · kind A · utility
21Cited by
2References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 15, 1985 |
| Grant date | May 6, 1986 |
| Priority date | — |
| Expiry date | Feb 15, 2005 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/549
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A pattern of a monomolecular film or a monomolecular built-up film is formed on a base through the steps of providing a lift-off layer on a base on which a monomolecular film or a monomolecular built-up film is to be deposited, depositing the monomolecular film or the monomolecular built-up film on the base and the lift-off layer, and removing the lift-off layer from the base.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.